Tag: South Korea

A joint research team led by Dr. Gu Ye-jin of the Natural Circulation Electronic Materials Research Institute at Inha University and the Polymer Engineering and Materials Synthesis Laboratory has recently attracted significant academic attention by consecutively proposing strategies to overcome the reliability issues and performance limitations of photoresist materials used in EUV lithography-based ultra-high-density semiconductor manufacturing processes.

EUV lithography is a technology that uses extremely short-wavelength light to draw ultra-fine semiconductor circuits at the nanometer scale. The material that actually forms the shapes of transistors and metal interconnects within integrated circuits is the photoresist, which undergoes chemical changes upon exposure to light to create the circuit pattern. As such, photoresists are considered a core patterning material essential for accurately fabricating semiconductor circuits.

Recently, tin nanocluster-based photoresists, which enable more precise circuit patterning than conventional organic photoresists, have emerged as promising next-generation materials. However, these materials suffer from limitations in that their properties change upon exposure to air during processing, leading to degraded pattern quality and reduced process stability.

Dr. Gu Ye-jin focused on the fact that this instability originates from a specific chemical property of tin—Lewis acidity. Because tin readily reacts with moisture in the air, she proposed a strategy to mitigate this issue by incorporating fluorine atoms. Through material synthesis and lithography experiments, she demonstrated that this approach significantly enhances the stability and process reliability of photoresists.

The fluorine-incorporated tin oxide photoresist synthesized by the joint research team exhibited excellent process stability, showing outstanding patterning resolution at the 10-nanometer (nm) scale without reliability degradation caused by atmospheric exposure. Furthermore, by leveraging the material properties enabled by fluorine incorporation, the team implemented a bilayer photoresist structure. As a result, circuits could be formed using lower EUV exposure doses, significantly improving overall process efficiency.

This research was conducted in collaboration with the Samsung Electronics Semiconductor Research Center under the support of the Samsung Future Technology Incubation Center. The results were recently published in Advanced Functional Materials, a highly influential international journal in materials science, under the title:

“Tin-Oxo Nanocluster Extreme UV Photoresists Equipped with Chemical Features for Atmospheric Stability and High EUV Sensitivity.”

In addition to this work, Dr. Gu also conducted research on chemically amplified resists (CARs), proposing a new approach to improve the productivity of EUV lithography processes. EUV lithography operates using light with a wavelength of 13.5 nm, and insufficient photon delivery during exposure can lead to degraded pattern quality.

Rather than increasing the exposure dose, Dr. Gu proposed incorporating high light-absorption elements into the photoresist. This strategy reduces photon loss during exposure, thereby enhancing pattern quality while maintaining process efficiency.

Experimental results confirmed that iodine is an effective element for improving the operational efficiency of chemically amplified photoresists. Based on these findings, the team synthesized a CT contrast agent–based radiation sensitizer containing a high concentration of iodine and applied it to commercial EUV photoresists. This approach successfully demonstrated simultaneous improvements in EUV sensitivity and pattern quality.

This research was carried out in collaboration with the Electronic Materials Division of Dongjin Semichem and was recently published in ACS Applied Materials & Interfaces under the title: “Positive Role of Iodine Atoms in Chemically Amplified Photoresists for Extreme Ultraviolet Lithography.”

Dr. Gu Ye-jin of the Natural Circulation Electronic Materials Research Institute at Inha University stated, “It was meaningful to propose solutions to advanced semiconductor technology challenges through close collaboration with industry. I will continue pursuing research that contributes to strengthening the competitiveness of Korea’s semiconductor technology.”

▲ Two key characteristics: By introducing fluorinated ligands into tin oxide, reactivity between tin and atmospheric molecules is reduced, chemical orthogonality is secured, and multilayer thin-film structures become feasible—resulting in enhanced resist sensitivity.

▲ Iodine was identified as a high-absorption element that improves the efficiency of chemically amplified photoresists. By applying a CT contrast agent–based radiation sensitizer containing a high concentration of iodine to commercial EUV photoresists, simultaneous improvements in sensitivity and pattern quality were demonstrated.

▲Dr. Gu Ye-jin of the Natural Circulation Electronic Materials Research Institute

Original Article

▲Participants pose for a commemorative photo at the 3rd Jisan-Hak Performance Forum.

Inha University held the 3rd Jisan-Hak Performance Forum on the 23rd to share the achievements and outcomes of collaborative initiatives jointly developed by regional education, industry, and the university.

The forum was organized to review the outcomes and progress of local industry university (Jisan-Hak) cooperation, aimed at strengthening region-based talent development and industrial linkages, while exploring directions for future advancement.

The event brought together a diverse range of stakeholders, including industry professionals, university faculty members, researchers from government-funded research institutes, and students. Participants shared field-oriented experiences and practical outcomes derived from Jisan-Hak collaboration.

Outstanding students were recognized for their accomplishments in Jisan-Hak collaborative curricula. Presentations were also delivered on exemplary educational operation models, supporter program cases, and best practices in linking student career development with employment. In particular, cases demonstrating the organic integration of school education, university expertise, and industry demand drew strong interest from attendees.

Key sessions highlighted how students are accumulating hands-on problem-solving experience beyond theory-based learning through various extracurricular activities, such as secondary battery competitions and global projects. These experiences were shown to broaden students’ career exploration and expand their options for major selection.

Industry representatives noted that incorporating real-world contexts into learning from the educational stage has significantly enhanced the quality of talent development.

A senior-to-junior scholarship presentation ceremony for the secondary battery major was also held. Alumni Ahn Chi-wan (Class of 2019, Department of Chemical Engineering), CEO of WorkX and a second-cohort graduate of the secondary battery major, donated a scholarship fund to support junior students, expressing his strong commitment to the academic community. Ahn recently received the 2025 Korea Talent Award.

Ahn stated, “My learning experience in the secondary battery major and the Jisan-Hak collaborative education program became an important foundation for my entrepreneurial journey,” adding, “I made this scholarship donation in hopes that my juniors can continue to challenge themselves and grow in a more stable environment.”

The university expects that this scholarship donation will further invigorate education and research in the secondary battery major, while strengthening the cooperative network between alumni and current students. The institution plans to continue building a sustainable, major-based talent development system.

To enhance employment competencies in the secondary battery industry, experts from academia, research institutes, and industry also participated as speakers in special lectures for students, receiving positive feedback.

Choi Jin-seop, Head of the Secondary Battery Project Group, said, “This 3rd Jisan-Hak Performance Forum provided an opportunity to confirm the outstanding result of our educational incubating efforts, while sharing a vision for an educational ecosystem aligned with Incheon’s advanced talent development strategies.” He added, “We will continue to expand models that support student growth and promote mutual development with regional industries through Jisan-Hak collaboration.”

Original Article

▲Students and industry representatives pose for a commemorative photo at the Corporate & Social Problem-Solving Project Final Presentation.

The Engineering Education Innovation Center recently hosted the 2025 Corporate & Social Problem-Solving Project Final Presentation.

The event featured a total of five teams, consisting of four competition-track teams and one advanced-track team. A panel of judges composed of industry experts, patent attorneys, and faculty members evaluated the teams’ presentations and prototypes.

Over a two-month period, students carried out a practice-oriented industry–academia cooperative capstone project that involved problem definition, design, prototype development, and feedback. The projects were based on real-world industrial challenges presented by Hyperdrive Korea Co., Ltd. and Hydrofast Co., Ltd.

The proposed project topics combined technological innovation with social value. They included the development of a non-powered ground reaction force ankle assist device for socially vulnerable individuals experiencing muscle loss, as well as smart agriculture technology utilizing four-wheel steering and driving systems.

Following the evaluation, the Grand Prize in the competition track was awarded to Team “Mu-Yaho.” The team developed a lightweight, custom-made walking assist device using a GFRP plate spring. The project demonstrated a high level of completeness through appropriate material selection (GFRP utilization), creative and precise design, and verification based on electromyography (EMG) measurements.

In particular, the team’s link structure design, which reflected joint motion mechanisms, and the systematic application of engineering elements were highly praised for achieving a technical level comparable to professional research standards.

The Excellence Award was presented to Team Balpyeonhan Sesang, while the Advanced Track Outstanding Technology Award was awarded to Team ALM.

Choi Soo-sung, CEO of Hydrofast Co., Ltd., stated, “Watching the students’ problem-solving processes was highly inspiring for the industry as well. I hope this project becomes a valuable asset in your future careers.”

Pyeon Seok-jun, Director of the Inha Engineering Education Innovation Center, commented, “This industry-collaborative project was a meaningful opportunity that provided students with real-world experience and growth. We will continue to expand industry-linked education models in the future.”

Original Article