NTU Creates Ultrathin Ta₃N₅ Photoanodes

Researchers from the Department of Chemistry at National Taiwan University have developed a novel method to synthesize ultrathin Ta₃N₅ photoanodes using a chemically engineered Ta₂N₃ precursor. This approach enables a 100nm tantalum nitride layer to achieve performance comparable to much thicker films made with conventional oxide precursors, while reducing tantalum usage.

The ultrathin films exhibit improved charge separation and enhanced photocurrent generation, overcoming the poor charge transport issues that have previously limited the practical application of Ta₃N₅ photoanodes. Trace subnitride impurities formed at the interface with silicon act as conductive pathways, facilitating efficient extraction of photogenerated carriers.

This advancement not only lowers material costs but also opens new possibilities for scalable solar-driven hydrogen production. By combining structural, optical, and electrochemical optimization, the study demonstrates a broadly applicable strategy for designing next-generation photoelectrodes.

https://labspotlight.ntu.edu.tw/focus/123?locale=zh-TW